Performance Indicators
|
Model |
Particle Size (nm) |
SiO₂ (%) |
Na₂O (%) |
pH |
Shelf Life |
|
K6460 |
30–40 |
30–50 |
≤0.4 |
9.5–10.5 |
≥12 months |
|
K6461 |
50–60 |
30–50 |
≤0.4 |
9.5–10.5 |
≥12 months |
|
K6462 |
80–90 |
30–50 |
≤0.4 |
9.5–10.5 |
≥12 months |
|
K6463 |
100–110 |
30–50 |
≤0.4 |
9.5–10.5 |
≥12 months |
|
K6465 |
110–120 |
30–50 |
≤0.4 |
9.5–10.5 |
≥12 months |
|
K6466 |
140–160 |
30–50 |
≤0.4 |
9.5–10.5 |
≥12 months |
Product Features
This series consists of polishing-grade nano silica sol products, offering a wide particle size range from 30 nm to 160 nm to precisely match the polishing requirements of different materials and process stages. Primarily used in formulating Chemical Mechanical Polishing (CMP) slurries, they are suitable for precision polishing of wafers, metals, ceramics, and other surfaces, as well as for preparing specialty functional coatings. The pH value of the entire series can be customized within the range of 3–11 to flexibly adapt to diverse process systems.
Note: pH value can be customized within the range of 3–11.
Packaging Specifications
Packed in polyethylene plastic drums, available in 25 kg, 250 kg, and 1000 kg specifications.
Storage Conditions
Avoid direct sunlight; storage temperature should be controlled between 5–40°C.
Storage temperature must not fall below 0°C; low temperatures can cause the colloid to freeze and result in permanent failure.
Containers must be sealed and kept closed for extended periods. Evaporation of water will cause silica particles to precipitate, directly affecting product performance.
